Lithography cabinets

User modified flow cabinets with equipment for photo-lithography (Karl Suss MBJ3 mask aligner, spin-coater, ultrasonic bath, hot-plates, purge stage). The equipment is optimized for use with 2 inch diameter semiconductor wafers.

Availability 

Instrument is clean room based and only available after mandatory clean room safety and equipment training.

Incidentally samples can be prepared on request.